News Article
Japanese research centre will collaborate on tachyon-based workflow
Brion Technologies in collaboration with Japan's Semiconductor Technology Academic Research Centre (STARC) will work to develop and test a complete design-for-manufacturing (DFM) workflow.
Brion Technologies in collaboration with Japan's Semiconductor Technology Academic Research Centre (STARC) will work to develop and test a complete design-for-manufacturing (DFM) workflow, enabled by Tachyon, Brion's optical proximity correction (OPC), resolution enhancement technology (RET) and OPC verification system.This workflow will integrate Tachyon with EDA products from Brion alliance partners. Seven of STARC's 11 member companies will participate in the project, including use of the DFM workflow for production on their respective 65nm designs."Working with Brion and its EDA partners is a natural next step for STARC, as we continue our mission of delivering proven methodologies to our member companies," said Nobuyuki Nishiguchi, vice president, general manager, development department-1 of STARC. "Most of STARC's member companies are already Brion customers and Tachyon users. They naturally want to use the same accurate, production-qualified lithography models created by Tachyon along their entire process flows, from design to mask making to manufacturing."Chipmakers are paying increasing attention to DFM as device designs continue to shrink from 65nm geometries to 45nm and then 32nm. With each generation, on-mask circuit patterns become increasingly complex because of the need for OPC and other resolution enhancement technology (RET) to ensure that subwavelength features are transferred correctly onto silicon."Having a lithography-aware design flow that correlates well to both mask making and device production is essential at the 65nm node and beyond," said Shauh-Teh Juang, Brion's senior vice president of marketing and business development. We're very pleased to be working with STARC, helping bring lithography-aware DFM to their members' design and production flows."
