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News Article

New lithography tool stimulates awareness in IC design flow

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Brion Technologies has announced the availability of Tachyon Lithography Aware Design (LAD), an extension of the company's Tachyon suite for optical proximity correction (OPC) verification and OPC application.

Brion Technologies has announced the availability of Tachyon Lithography Aware Design (LAD), an extension of the company's Tachyon suite for optical proximity correction (OPC) verification and OPC application. Tachyon LAD gives advanced integrated circuit (ICs) designers the ability to accurately assess how circuit designs will print on silicon under real-world production conditions.

"IC designers are aware that, in the deep submicron phase, occurrences take place to silicon during the manufacturing process that are not accounted for in the design implementation phase," said Mike Gianfagna, vice president of design business for Brion. "Tachyon LAD can accurately predict what will appear in silicon, illustrating silicon contours and hot spots, showing designers where and how to correct these problems before the first tapeout."

Tachyon LAD analyses standard GDSII data modelling how the lithography process will reproduce a design on silicon, eliminating the need for EDA vendors to develop new software tools or become experts in the manufacturing process. Tachyon LAD works with existing manufacturing processes and flows, so there is no need to calibrate new models to drive the process.

Brion is offering Tachyon LAD through its initial EDA partners Cadence Design Systems, Magma Design Automation and TOOL Corp. Several customers including Japan's Semiconductor Technology Academic Research Centre (STARC) are already working with Tachyon LAD along with these EDA vendors' respective design tools.

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