News Article
Combined effort will provide advanced DFM capabilities
Mentor Graphics Corporation and Taiwan Semiconductor Manufacturing Company, have announced that Mentor's design-for-manufacturing (DFM) and design-for-test (DFT) tools have been incorporated into TSMC Reference Flow 8.0.
Mentor Graphics Corporation and Taiwan Semiconductor Manufacturing Company, have announced that Mentor's design-for-manufacturing (DFM) and design-for-test (DFT) tools have been incorporated into TSMC Reference Flow 8.0. The new Reference Flow 8.0 features Mentor tools for critical area analysis and reduction, chemical-mechanical polishing (CMP) analysis and layer planarity control using smart fill algorithms, litho-friendly design, process variability aware analysis, and DFT flows based on Mentor Graphics Calibre and TestKompress solutions. "Mentor is pleased to have the opportunity to again demonstrate the production worthiness of our DFM and DFT solutions at TSMC's dedicated semiconductor foundry," said Joe Sawicki, vice president and general manager, Design to Silicon Division, Mentor Graphics. "Our continued collaboration with TSMC will help designers address the challenges of nanometre semiconductor design and manufacturing.""We believe that Mentor Graphics' DFM tools will further expand the confidence of designers who have been using Calibre for physical verification signoff," said Kuo Wu, deputy director of design services marketing at TSMC. "Mentor Graphics DFM tools are interoperable with the design tools in Reference Flow 8.0, enabling them to fit easily into our customers' flows."
