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News Article

Acquisition to address need for design-to-fab flow for 65 and 45 nanometres

News
Mentor Graphics Corporation has announced it has acquired Sierra Design Automation.
Mentor Graphics Corporation has announced it has acquired Sierra Design Automation "At 65 and 45 nanometres (nm), discontinuities such as process variation, design size, low power and DFM are creating a major disruption in physical design. The merger with Mentor enables us to deliver a powerful design-to-fab flow that addresses these discontinuities in a comprehensive fashion," said Pravin Madhani, president and CEO, Sierra Design Automation. "Our customers are telling us that they need a design-to-fab flow capable of handling dozens of process corners and multiple modes, all while addressing manufacturability challenges to achieve manufacturing closure of their designs. Mentor and Sierra's position in these areas make us a natural fit. The acquisition of Sierra expands Mentor's position in DFM, and provides the integration that customers need between physical design, and back-end verification and yield-enhancement," said Walden C. Rhines, CEO and chairman, Mentor Graphics."STMicroelectronics is designing some of the most complex chips and is aggressively pursuing advanced process geometries with 65 and 45 nm designs in production and in progress today," said Philippe Magarshack, Group Vice President, Central CAD General Manager, STMicroelectronics. "We decided to partner with Mentor and Sierra 18 months ago to address critical discontinuities that we identified in the design flow including low-power, design for variability and manufacturing. We are very impressed with the quality of the results of this partnership, which allows us to blend manufacturability know-how into the physical synthesis and routing phase."
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