News Article
Japanese company unveils new immersion and dry lithography tool
Sokudo Co. has rolled out its new RF3S coat/develop track system for 45nm and beyond immersion and dry lithography.
Sokudo Co. has rolled out its new RF3S coat/develop track system for 45nm and beyond immersion and dry lithography. Sokuso's RF3S provides <0.8nm, 3 sigma critical dimension (CD) uniformity and immersion defect density of <0.1 defects/cm2. The RF3S delivers benchmark productivity with a throughput of 180 wafers per hour. Sokudo has multiple orders for its new RF3S systems, which are scheduled to begin shipping this month.The RF3S offers both biased heater and isothermal technology, depending on the application. Biased hot plate technology incorporates independently controlled heater zones to precisely control temperature across the wafer, enabling optimized CD uniformity for post-lithography or etch. The system's isothermal solution uses Sokudo's proven Rapid Hot Plate (RHP) design for uniform plate temperature without the need for tuning to achieve uniform CD, with an option that adjusts for wafer warpage according to the company.Key to the RF3S system's high productivity is its flexible coat cell design that allows up to four spin coat modules and up to six SDC (Sokudo Defect Clean) Soak modules. The SDC Soak modules, which utilise wafer-cleaning technology from Dainippon Screen, remove defects before and after immersion exposure. The system's new ECO nozzle shortens develop time by more than 60%, while a faster transfer robot, a faster exposure system interface and reductions in module overhead time decrease wafer handling time and increase system throughput by 20%. For improved availability, the RF3S employs integrated tool monitoring and diagnostics using the Applied Materials' NeXus real-time SPC (statistical process control) tool to perform split-second analysis of system conditions and immediately spotlight and monitor changes. The system also offers multiple options for integrated optical CD metrology for process monitoring."The RF3S combines technology from both Dainippon Screen and Applied Materials to deliver process and immersion defect control in coat/develop track," said Takashige Suetake, CEO of Sokudo. "The RF3S builds on our established RF3 platform, with over 200 systems installed, to provide customers with process capability and higher productivity for a broad range of immersion and advanced dry lithography applications."
