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Licensing agreement signed for thin film deposition global technology exclusivity
InterCrossIP Management LLC has signed exclusive, global license agreements with Uk based Ceimig and Simon Fraser University (SFU) in Canada for the commercialisation of a thin film deposition technology platform based on organometallic precursors.
InterCrossIP Management LLC has signed exclusive, global license agreements with Uk based Ceimig and Simon Fraser University (SFU) in Canada for the commercialisation of a thin film deposition technology platform based on organometallic precursors. Photochemical Metal Organic Deposition (PMOD) technology has significant advantages in the printing and production of integrated circuits. PMOD is used to deposit thin (<200nm) layers of metals such as Au and Pt, metal oxides such as Al2O3, ZnO and TiO2, and mixed metal oxides such as BaTiO3, PZT and ITO. These materials can be directly patterned to line widths below 5nm. The combined IP portfolios include 14 issued and 7 pending US patents, with numerous international counterparts.
