News Article
Acquisition strengthens DFM core technology solutions
Cadence Design Systems, Inc. has announced that it has acquired Invarium, Inc.
Cadence Design Systems, Inc. has announced that it has acquired Invarium, Inc. This acquisition creates a path to the industry's DFM solutions for functional and parametric yield improvement, enabling the prevention, detection, correction and optimisation of manufacturing effects on advanced geometry designs. Invarium's specific area of expertise is the development of pattern-synthesis technologies that enable photomask design and process optimisation, encompassing the entire manufacturing-process flow from mask making to lithography and etch, with speed. "Invarium's layout-to-mask solution is in use by manufacturers of custom and memory designs at advanced process nodes, where the highest level of accuracy and widest process latitudes are required," said Roy Prasad, president and CEO of Invarium. "Augmenting the Cadence design-side DFM with Invarium's manufacturing technology will allow us to provide global customers a comprehensive DFM solution, from design implementation through silicon signoff and manufacturing." "At 45 nanometers and below, the semiconductor industry is looking at a new set of patterning challenges that include double patterning, printability and scaling of very fine features, and the margin for error is extremely small," said Jim Miller, executive vice president, Products and Technologies Organisation, for Cadence. "The acquisition of Invarium will enhance Cadence's ability to address these challenges head-on."
