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Higher volume manufacturing planned with relocation of photoresist stripper

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Mallinckrodt Baker, Inc. has announced plans to move its BAKER ALEG-380 photoresist stripper and residue remover into its high-volume manufacturing facility.
Mallinckrodt Baker, Inc. has announced plans to move its BAKER ALEG-380 photoresist stripper and residue remover into its high-volume manufacturing facility. The product is expected to be fully transitioned to higher volume production by October 2007. "The semiconductor industry is continually challenged to meet advanced performance requirements with lower manufacturing costs. Mallinckrodt Baker's BAKER ALEG-380 photoresist stripper and residue remover provides a solution to these challenges. Transitioning BAKER ALEG-380 residue remover to higher volume production will address our near- and long- term customer requirements," said Gary Dailey, global marketing manager – integrated circuit materials. Mallinckrodt Baker has developed the BAKER ALEG-380 formulation to be easily integrated into established manufacturing processes. It can be used as a one-step chemistry in traditional semiconductor processes containing aluminum and silicon dioxide layers, as well as in back-end packaging processes such as flip chip and bump applications. It is also bath and spray tool compatible.
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