News Article
Order placements for multi-system from research consortium announced
Metryx has announced that it has received orders from a major research consortium for its Mentor SF3 300 mm tool and Mentor OC23 200 mm tool. During the evaluation phase, the Mentor successfully identified previously undetected process trends, demonstrating the value mass metrology offers to the industry.
Metryx has announced that it has received orders from a major research consortium for its Mentor SF3 300 mm tool and Mentor OC23 200 mm tool. During the evaluation phase, the Mentor successfully identified previously undetected process trends, demonstrating the value mass metrology offers to the industry. In the facility, the tools will be used to monitor a number of applications including shallow trench isolation, etch, deposition and CMP for both metal and dielectric layers. The Mentor demonstrated high enough throughput to be used as an inline metrology tool and because it is non-destructive it can be used directly on device wafers. "These orders from an R&D centre clearly show the value-add mass metrology brings to semiconductor manufacturing," explained Dr. Adrian Kiermasz, CEO of Metryx, Ltd. "So many processes have a measurable mass change and the Mentor's versatility allows it to ensure process repeatability across a broad spectrum of manufacturing technologies. This makes it extremely valuable to semiconductor fabs, and in particular those working with novel processes or high product mix scenarios."
