News Article
Collaboration will develop and study photoresist and particle removal technology
Eco-Snow Systems has formed a joint development program with Belgian nanoelectronics research centre IMEC to develop and study photoresist and particle removal processes using CO2-based cryogenic cleaning systems.
Eco-Snow Systems has formed a joint development program with Belgian nanoelectronics research centre IMEC to develop and study photoresist and particle removal processes using CO2-based cryogenic cleaning systems. Eco-Snow is an affiliate of The BOC Group, plc, which Linde AG acquired in 2006 and which is now known globally as The Linde Group. Eco-Snow and IMEC will assess the effectiveness of solid aerosol cleaning in conjunction with solvent-based, non-oxidising wet chemistries in removing ion-implanted photoresist and post low-k etch resist in front- and back-end-of-line integrated device manufacturing process."This joint development program gives Eco-Snow a great opportunity to develop and validate the effectiveness of removing ion-implant and low-k etch resist by combining CO2 solid aerosol-based processes with the non-oxidising, solvent chemistries IMEC is studying. It is particularly timely, as wafer manufacturers look for methods of removing ion-implanted photoresist with minimal silicon consumption and attack to transistor metal gates – a key concern in manufacturing of complementary metal oxide semiconductor-based devices," said Souvik Banerjee, director of technology, Eco-Snow.Successful electronic devices depend on the removal of photoresist and nanometre-sized particles several times during the manufacturing process. Joe Clark, general manager, Eco-Snow Systems, said, "Eco-Snow's solid CO2-based aerosol process is a key step in several manufacturing processes such as photomask, MRAM, MEMS, compound semiconductor based devices, and back-end assemblies such as imaging devices. We intend to bring the success of this technology to silicon semiconductor-based device manufacturing; the partnership with IMEC is a key step in that direction."Paul Mertens, manager of IMEC's cleaning research program, said, "To reduce substrate loss and minimise potential damage, IMEC is investigating the feasibility of plasma-free removal of photoresist that is hardened by processes such as ion implantation. First tests have indicated that the use of Eco-Snow's CO2-based aerosol treatment prior to a wet photoresist strip has proven to significantly enhance the efficiency of photoresist removal. In its advanced cleaning research program, IMEC intends to further explore and optimise the performance of such a CO2-based aerosol pretreatment in close collaboration with Eco-Snow."
