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Research academy selected for lithography simulation and analysis software integration

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Blaze DFM has been chosen by the Semiconductor Technology Academic Research Centre (STARC) to provide lithography simulation and analysis software that will be integrated into the STARCAD-CEL (Certified Engineering Linkage, one step ahead of DFM) reference design flow.
Blaze DFM has been chosen by the Semiconductor Technology Academic Research Centre (STARC) to provide lithography simulation and analysis software that will be integrated into the STARCAD-CEL (Certified Engineering Linkage, one step ahead of DFM) reference design flow. With this methodology is establishing a process-friendly and low-power reference flow that strives to eliminate manufacturing uncertainty in sub-65nm system LSI designs.As part of the selection process, STARC performed a rigorous three-month evaluation of Blaze Halo using three 65nm designs. Halo offers both signoff accuracy and fast turnaround due to its incremental architecture. STARC engineers evaluated Halo using multiple rule sets and process windows to identify lithographic errors, or "hotspots", on all metal and via layers. They also measured the scalability of Halo using different configurations of one, two, four, eight, 16, and 27 processors."For many of our member companies, it is critical to be able to accurately predict the photolithographic printability of their most advanced designs," said Nobuyuki Nishiguchi, vice-president and general manager of Development Dept.-1 at STARC. "The importance of accuracy cannot be over-stated when choosing a lithography analysis solution. Blaze Halo provides fast, accurate lithographic variability analysis while being extremely scalable and robust under numerous process settings, hotspot rule sets, and CPU configurations."The silicon image representation produced by Halo is composed of a collection of manufacturing-centric variants of the physical integrated circuit design, including the original layout, a version of the layout as printed in silicon, and a series of error vectors that identify potential lithographic hotspots.Halo is plug-compatible with existing standard EDA design flows. By utilising an accurate physical representation of the design as printed in silicon, this approach facilitates improvements in yield, predictability, and performance using existing design tools."STARC's membership includes all of the major semiconductor companies in Japan, so their endorsement of Halo is of great strategic significance," said Jacob Jacobsson, president and CEO at Blaze. "STARC identifies and qualifies new technologies for advanced silicon processes and, as part of their reference flow, Halo becomes the lithography analysis solution of choice for their members."
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