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ASML claim wafer per day record

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ASML have announced that a Taiwanese customer using its TWINSCAN i-Line scanners has achieved an unprecedented level of 300mm productivity by processing 150 wafers per hour for 24 hours, reaching a record output of 3,596 wafers in a single day.
ASML have announced that a Taiwanese customer using its TWINSCAN i-Line scanners has achieved an unprecedented level of 300mm productivity by processing 150 wafers per hour for 24 hours, reaching a record output of 3,596 wafers in a single day.

"Our i-Line machines are future-proof. Not only do they offer the highest industry throughput, they also provide the tightest overlay available for 45-nm processes in volume production," said Bert Koek, general manager of 300-mm business at ASML. "Overlay in the back-end layers will be one of the critical success factors in coming years as memory chip makers move to 45-nm immersion lithography."

"i-Line remains an excellent technology for necessary, but less critical, 250-nanometer (nm) chip features," said Klaus Rinnen, Managing Vice President, Gartner, Inc.. "Even after advanced lithography moves on to 45-nm and smaller device features, there is still going to be a significant place for i-Line for many years to come."

ASML sold 30 300-mm i-Line machines in the first half of 2007, more than the total number sold during 2006.
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