News Article
IMEC to acquire EUV pre-production tool from ASML
IMEC has reached an agreement with ASML to install an ASML EUV pre-production tool in IMEC's 300mm facility in 2010.
IMEC has reached an agreement with ASML to install an ASML EUV pre-production tool in IMEC's 300mm facility in 2010. This will enable IMEC and its partners to do research on 22nm CMOS on the world's most advanced lithography system.
The installation of the pre-production tool follows ASML's alpha-demo tool (ADT) at IMEC from which first high-resolution images were obtained with an Sn source (Philips Extreme UV). World first horizontal and vertical 35nm and 40nm lines and spaces in 100nm MET-2D resist (Rohm & Haas) at 18mJ/cm2 were successfully exposed with EUV using an Sn source.
Whereas the goal of the ADT is to pioneer the technology, demonstrate feasibility and build the infrastructure, the pre-production tool will exhibit considerably higher source power and optimised optics. This will enable full-scale development of EUV technology up to production worthy standards.
The installation of the pre-production tool follows ASML's alpha-demo tool (ADT) at IMEC from which first high-resolution images were obtained with an Sn source (Philips Extreme UV). World first horizontal and vertical 35nm and 40nm lines and spaces in 100nm MET-2D resist (Rohm & Haas) at 18mJ/cm2 were successfully exposed with EUV using an Sn source.
Whereas the goal of the ADT is to pioneer the technology, demonstrate feasibility and build the infrastructure, the pre-production tool will exhibit considerably higher source power and optimised optics. This will enable full-scale development of EUV technology up to production worthy standards.
