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Vistec acquires multi electron beam IP

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Vistec has announced that it recently acquired intellectual property to pursue their activities for multiple electron beam lithography technology.
According to its Lithography Group president, Dr. Jai Hakhu, it will integrate this IP into projects to continue developing high throughput electron beam systems for direct write as well as mask making applications. These systems will be based on Vistec's production proven electron beam lithography platform. Vistec (former Leica Microsystems Lithography) has a long tradition in developing and manufacturing electron beam lithography equipment. With its full 300mm capability the shaped beam lithography systems are currently used for device development and early prototyping in direct write mix-and-match lithography, mask making and integrated optics.
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