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Rohm and Haas achieves ISO 9001:2000 certification

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Rohm and Haas Electronic Materials, CMP Technologies, a leader and innovator in chemical mechanical planarisation technology for the global semiconductor industry, has announced that its newest plant in Hsinchu, Taiwan has achieved International Organisation for Standardisation (ISO) 9001:2000 status for the manufacture of CMP polishing pads.
“As part of our continuous improvement programme, CMP Technologies has adopted an integrated manufacturing approach across its facilities,” explained Cliff Chen, plant manager of CMP Technologies Asia-Pacific Manufacturing and Technical Centre. “Rapidly achieving ISO 9001:2000 certification for the new plant in Hsinchu was a key component of bringing this plant on-line and ensuring that it delivers the same standards of quality and consistency for which Rohm and Haas CMP pads are known worldwide.” CMP Technologies manufactures pads and slurries used for chemical mechanical polishing (CMP) in semiconductor manufacturing and related industries. To ensure the highest quality and customer satisfaction, CMP Technologies pursues all relevant ISO certifications for all of its manufacturing and operations facilities, including environmental, health and safety programs. CMP Technologies conducts routine internal audits through ISO-trained auditors to verify that its systems meet the stringent requirements and are effectively implemented and maintained. ISO is a network of the national standards institutes of 157 countries and is a non-governmental organisation that forms a bridge between the public and private sectors. Standards ensure desirable characteristics of products and services such as quality, environmental friendliness, safety, reliability, efficiency and interchangeability, and at an economical cost. The ISO 9001:2000 registration covers manufacturing, quality, supply chain, research and development, administration, marketing and sales.
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