News Article
Carl Zeiss & SEMATECH develop novel design
Photomask registration and overlay metrology to enable double patterning lithography.
In a potential boost to advance lithography, engineers at SEMATECH and Carl Zeiss SMT announced the completion of their final design for the next generation photomask registration and overlay metrology system, called PROVE. The successful final system design release is a major milestone within the project. PROVE will allow for the production of more advanced photomasks with substantially improved image placement accuracy. Double patterning lithography, in particular, requires tighter image placement control for photomasks, but the new system will also enhance photomask production in general.
