Drop the mask
A new research programme on multi beam lithography has received funding from the European Commission 7th Framework Programme (FP7). The programme has been given the illuminating title of MAGIC, or "MAskless lithoGraphy for IC manufacturing," and the aim is to drive European mask less lithography technologies as developed by MAPPER Lithography B.V. (Netherlands) and IMS Nanofabrication AG (Austria), the latter focused on PML2 (Projection Mask Less Lithography).
In addition, the necessary infrastructure on data preparation, proximity effect corrections and process will be developed. Begun January 1, 2008, the three year project aims to deliver alpha tool platforms for 32nm half pitch technology by the end of 2010.
The MAGIC consortium, headed by CEA-LETI, involves 12 companies: CEA-LETI, MAPPER Lithography B.V., IMS Nanofabrication AG, ims-chips Stuttgart, Delong Instruments a.s., Fraunhofer Institutes, Synopsys International Ltd., STMicroelectronics, Qimonda AG, Fachhochshule Vorarlberg GmbH, Fujifilm Electronics Material NV (Belgium), and KLA-Tencor Corporation.
Maskless lithography represents an attractive technique for the industry due to its cost benefit model, natural flexibility and resolution capability. For these reasons, electron multi-beam lithography is being supported by leading IC manufacturers, such as STMicroelectronics, Qimonda and TSMC and the soaring research costs make it difficult for companies to approachthe challenge alone.
"This consortium is very important to create the necessary dynamics for the technology to take off, as well as to leverage awareness of the technology and reach critical mass for adoption," comments Laurent Pain project co-ordinator at CEA-LETI. "The MAGIC programme intends to demonstrate the capabilities of the technology by developing tools and infrastructure to ensure successful introduction into the industry environment," he added.
"We initiated this large European project based on our long experience in e-beam direct write lithography both at the CEA-LETI site and through our partnership with the Crolles 2 Alliance. This project is a unique opportunity to assess the mask less lithography and to build the necessary infrastructure in a pilot line environment before its introduction in the industry," said Serge Tedesco, lithography programme manager at CEA-LETI.
