News Article
SUSS MicroTec and Philips Research sign license agreement
The companies sign a licence agreement to develop a new nano imprinting technology. It will be called ‘Substrate Conformal Imprint Lithography’ (SCIL)
SUSS MicroTec, supplier of solutions for the 3D, MEMS, Advanced Packaging and Nanotechnology markets, has entered a license agreement with Philips Research, for a new enabling technology called Substrate Conformal Imprint Lithography (SCIL). The aim of this co-operation is to bring an existing equipment platform with this additional Nanoimprinting (NIL) feature to the market, enabling new approaches to large area imprint applications along with excellent printing resolution and repeatability.
This new imprint technology for sub 50nm patterning is bridging the gap between small rigid stamp application for best resolution and large area soft stamp usage with the usual limited printing resolution below 200nm. SCIL is an enabling technology offering the best of two worlds, large area soft stamps with repeatable sub 50 nm printing capability, avoiding stamp deformation as no contact force is applied, non UV based curing at room temperature and allowing high aspect ratios even up to 1:5 and more
The lab aligner platform from SUSS MicroTec, handling the 150 and 200 mm UV lithography, will be available and upgradeable with this feature. Immediate availability for sampling is given with the current test setup. Market introduction with fully implemented SCIL functionality into SUSS’ lab aligners is scheduled for later this year.
“SCIL represents an enabling new technology that paves the way for further commercialisation of nanoimprint lithography”, said Rolf Wolf, general manager of SUSS MicroTec lithography division. “This collaboration with Philips Research significantly broadens the range of nanoimprint lithography processes we can offer our customers.”
