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Cymer and Toshiba agree over multi unit light source

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This partnership could indicate a growing XLR technology adoption among chipmakers.
Cymer, a supplier of light sources used in semiconductor lithography, announced it has reached a significant multi unit agreement with Toshiba. Under the agreement, Toshiba will include Cymer's krypton fluoride (KrF) and argon fluoride (ArF) light sources in Toshiba's future 300mm investment plan at its memory fab in Japan.

As a part of this agreement, Toshiba’s new light sources and current installed systems will receive light source support through Cymer’s 'By the Pulse Programme'. Toshiba will also benefit from the Cymer’s gas control system which will come integrated on lasers, extending the gas refill interval from 100 million pulses to 2 billion pulses and enabling increased scanner output and availability. Toshiba is expected to achieve higher productivity and lower cost of operation for its existing and expanding Cymer installed base.

“This agreement symbolises Cymer’s strong commitment to Toshiba’s business model and long term success, as well as the rising adoption of our next generation XLR technology among top global chipmakers,” said Ed Brown, president and chief operating officer for Cymer. “We look forward to supporting Toshiba’s aggressive productivity improvement objectives for years to come.”

Released in July 2007, the prevalence of Cymer’s XLR platform for scanner and chipmaker customers has increased steadily in 2008. The XLR 500i systems to be selected by Toshiba will offer significant advances in performance, availability and extendibility, providing a path for Toshiba to attain high volume production while lowering operating costs of lithography. Additionally, the XLR 500i lasers feature Cymer’s advanced bandwidth stabilisation (ABS) technology, delivering superior bandwidth performance that achieves predictable and repeatable wafer level process control.

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