Innovative ion implant system offers new capabilities
IBS, a specialist in ion implant, has announced a new and innovative product known as Flexion again emphasizing continued expertise and value in the world of evolving ion implant applications. This is the first implant system that achieves 400 KeV in a single charge AND simultaneously can implant substrates heated at 600°C. This doubles the energy range of the previous IBS system known as the IMC. "This innovation is critical to some emerging applications that need to go above 340 KeV that existing systems have as a limitation." explains Laurent Roux, Founder and President of Ion Beam Services
Flexion systems deliver approximately 20 to 25% higher beam current performance relative to other medium current implanters. Another significant advantage is that Flexion can process a wide range of substrate materials (SiC, HgCdTe, GaAs, GaN, "¦) as well as exotic species such as aluminum or beryllium, required for many rapidly advancing applications like power components and infrared optics.
A First Tool Already Operational In A Research Institute In Beijing
Already meeting the expectations of Chinese Research, the first 400keV tool sold is used to manufacture optoelectronics components. Flexion is specifically well suited to and efficient for this application thanks to the wide range of dopants offered, as well as its capability to cool down to -100°C. IBS is becoming a major actor on the Chinese market. IBS also had the breakthrough performed in Asia in Nov 2016 with the IMC tool for the benefit of the Laboratory of the Chinese University Xi'An Jiaotong, ranked 21st in the world.
