Info
Info
News search:

< Page of 408 >

News


Monday 6th October 2003
BAOBERLIN in Germany has developed a high power light emitting diode (HL-LED). The company says that the device generates 20 times higher light output because currents reach 600mA rather than the 30mA typical with 2.8x3.2mm2 formats.
Monday 6th October 2003
SUSS MicroTec has developed a method of plasma surface activation and wafer to wafer bonding for silicon on insulator (SOI) and strained silicon applications. nano PREP reduces the process temperature to 200C allowing new applications for wafer level integration of CMOS and micro-electro-mechanical systems (MEMS) or CMOS and nanotechnology. The technology uses atmospheric pressure plasma to generate a molecular level surface modification to enable the low temperature bonding.
Friday 3rd October 2003
Holding the largest stock of used vacuum equipment in the UK, we supply world wide Reconditioned Rotary Pumps, Dry Star, Diffusion Pumps, Coaters, Degassing and Casting Systems components, spares and service. To register for updates via email relating to our products or see our latest stock please click here
Friday 3rd October 2003
Infineon Technologies is offering lead- (Pb-) and halogen-free DRAM components and memory modules.
Friday 3rd October 2003
The University of Duisburg has developed an optical measurement technique for quality control of nano electronic circuits that are developed using nano imprint lithography (NIL). The system was produced in co-operation with a microelectronic manufacturer.
Friday 3rd October 2003
Sigma-C has raised $2.87mn in a first round of financing from Deutsche Venture Capital (DVC). Sigma-C plans to use the money to accelerate the launch of design-to-manufacture software products for the semiconductor industry that more closely link electronic design automation (EDA) software, photomask production and wafer fabrication.
Info
Friday 3rd October 2003
Carl Zeiss Microelectronic Systems GmbH (MES) of Jena has changed its name to Carl Zeiss SMS GmbH (Semiconductor Metrology Systems). The subsidiary of Carl Zeiss SMT AG will combine the activities of the former MES subsidiary and LEO Electron Microscopy. Carl Zeiss SMS currently has more than 80 employees.
Friday 3rd October 2003
Toshiba has produced a prototype of a compact, direct methanol fuel cell (DMFC). The company believes that this opens the way to the use of DMFC as an alternative power source to recharge batteries for personal devices.
Friday 3rd October 2003
The European IMEC research centre has installed a SUSS PAV150 at its Leuven (Belgium) facility to test micro-electro-mechanical system (MEMS) devices (in particular RF MEMS) in a high vacuum environment. The system enables reliability tests of MEMS under real-life conditions.
Wednesday 1st October 2003
IBM claims to be the first to build SiGe bipolar devices using thin layer silion-on-insulator (SOI) wafers. The company believes that this paves the way to building SiGe bipolar and CMOS circuits on the same thin SOI wafer, maximising the performance of both the computing and communications functions.
Wednesday 1st October 2003
STMicroelectronics released details of an advanced research programme that it hopes will substantially reduce the cost of generating electricity from solar power. The research team, based in Catania and Naples, Italy, is focusing on applying expertise in nanotechnology to the development of new solar cell technologies. It is hoped the final products will eventually be able to compete commercially with conventional electricity generation methods such as burning fossil fuels or nuclear reactors.
Wednesday 1st October 2003
Applied Materials has obtained an exclusive patent licence from SCP Global Technologies to integrate single-wafer vapour drying technology on the Reflexion LK chemical mechanical planarisation (CMP) system.
Info
Monday 29th September 2003
Schott Lithotec will supply International SEMATECH (ISMT) with advanced mask blanks for use in extreme ultraviolet (EUV) lithography.
Friday 26th September 2003
eMagin’s organic light emitting diode (OLED) microdisplays are being used in the second generation of VRmagic’s EYESI virtual reality (VR) ophthalmic surgical training equipment. The system provides real-time simulation, biomechanical tissue simulation, tracking and stereo imaging.
Friday 26th September 2003
The Fraunhofer Institute site in Itzehoe, Germany, will be using SUSS MicroTec’s SB6e 150mm substrate bonder to develop commercially viable micro-electro-mechanical system (MEMS) applications.
Friday 26th September 2003
Nippon Telegraph and Telephone (NTT) researchers have successfully prepared KTN crystals (KTa1-xNbxO3) with the highest electro-optic effect ever reported. In addition, NTT has developed film growth and lithographic techniques that can be used to fabricate optical waveguides with excellent performance.
Friday 26th September 2003
Infineon Technologies has produced a new test chip designed to allow production processes of complex semiconductors to be tested and improved. The chip is based on a circuit developed at the Regensburg University of Applied Sciences in Germany.
Friday 26th September 2003
Carl Zeiss Microelectronic Systems has delivered its first Aerial Image Measurement System (AIMS) for 157nm optical lithography to International SEMATECH (ISMT) in Austin, Texas. The tool is to be used to develop cutting-edge 157nm photomask technology.
Info
Friday 26th September 2003
The US National Electronics Manufacturing Initiative (NEMI) presented the recommendations of its Tin Whisker Accelerated Test Project. The project team has submitted a test method document to JEDEC that recommends two storage conditions and one temperature cycling condition to evaluate the propensity of tin-based plating finishes to grow whiskers.
Wednesday 24th September 2003
European infrared image sensor developer XenICs has signed a sales and marketing agreement concerning its high-performance near-infrared InGaAs camera with US company Electrophysics. The camera has a spectral response in the range 0.9-1.7microns. Electrophysics develops of near infrared, night vision and thermal imaging systems. It will add the XenICs InGaAs camera to its product line.
Wednesday 24th September 2003
Veeco Instruments is market CAPRES’ proprietary Microscopic Four-Point Probe (M4PP) technology on Veeco atomic force microscopes (AFMs) under an OEM agreement.
Wednesday 24th September 2003
UK company Filtronic reports that it has been selected by a new OEM customer to supply initial quantities of an integrated radio frequency head unit to be installed in 3G wideband code division multiple access (WCDMA) base stations. Production quantities are not expected to commence until H2 2004.
Tuesday 23rd September 2003
Researchers at the Fraunhofer Institute for Applied Optics and Precision Engineering (IOF) in Jena have been working on an optical microphone since 2002 on behalf of Sennheiser electronic.
Tuesday 23rd September 2003
National Research Council of Canada's Industrial Materials Institute (NRC-IMI) has agreed to buy an EVG520HE semi-automated hot embossing system from European toolmaker EV Group (EVG).

×
Search the news archive

To close this popup you can press escape or click the close icon.
Logo
×
Logo
×
Register - Step 1

You may choose to subscribe to the Silicon Semiconductor Magazine, the Silicon Semiconductor Newsletter, or both. You may also request additional information if required, before submitting your application.


Please subscribe me to:

 

You chose the industry type of "Other"

Please enter the industry that you work in:
Please enter the industry that you work in:
 
X
Info
X
Info