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Monday 28th April 2014
The company says it is the first and only semiconductor industry outsourced process tool parts cleaner to participate in the programme
Monday 28th April 2014
The firm says this will allow data centres to improve workload management for social networking, web browsing and email experiences for users
Monday 28th April 2014
Computer end-use systems maintain a stronghold in Japan, while the automotive apps market is big in Europe
Monday 28th April 2014
Spaser-based devices could provide an alternative to transistor-based devices such as microprocessors, memory, and displays
Monday 28th April 2014
The JEDEC UFS Ver.2.0 standard compliant embedded memories combine up to 64GB NAND and a controller in a single package
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Monday 28th April 2014
Electronic components made up of a layer of molybdenite superposed on a layer of silicon can produce light due to the the special properties of molybdenite
Friday 25th April 2014
The 14 nm FPGA test chips confirm the performance, power and density advantage Altera receives using one of the industry’s most advanced process technologies
Thursday 24th April 2014
Researchers are trying to maximise the collisions between photons and electrons in the thinnest possible layers of photovoltaic material 
Thursday 24th April 2014
The strategic collaboration is aimed at enabling the firms to share technology and allow global capacity for 14nm FinFET fabrication in the U.S. and Korea
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Thursday 24th April 2014
O-Film will be entitled to Tessera's MEMS IP license, Fotonation repaid royalties, equipment sales and sale of selected non-core patents
Wednesday 23rd April 2014
EV Group is leading, Applied Materials and Tokyo Electron are merging. What will happen next Yole asks?
Wednesday 23rd April 2014
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Wednesday 16th April 2014
Suited to 200 and 300mm wafers, the tool is claimed to use fewer chemicals, shorten process times and enable high wafer-to-wafer consistency
Tuesday 15th April 2014
The merger of Diamond Innovations and Sandvik Hard Materials intends to broaden materials solutions and increase R&D and application developments

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