PV Technologies India Limited (PVTIL), a subsidiary of Moser Baer India Limited, has completed deposition trials for Gen 8.5 a-Si (Amorphous Silicon) thin film modules, at its new 40 MW facility in Greater Noida.
The Company’s board of directors held a meeting and approved a plan to repurchase up to US$1 billion (approximately NT$30.43 billion), or no more than 500 million shares, of the company’s common shares from the open market.
The two partners will assess the construction of a plant in Italy to manufacture panels using Sharp’s triple junction thin film technology. Sharp is entrusting Enel.si with the development of new photovoltaic fields in Italy for a total capacity of 161 MW
The company will establish its presence in Korea with the opening of a subsidiary to strengthen customer sales, service and support efforts and to augment existing R&D partnerships. Also to increase R&D and high volume manufacturing efforts.
Mattson Technology sets new standard with Alpine new photoresist strip product for BEOL and FEOL. Applications at sub 65 nanometre nodes. Initial system shipped to major semiconductor manufacturer in Taiwan