+44 (0)24 7671 8970
More publications     •     Advertise with us     •     Contact us
 
News Article

ZEISS launches a new high performance wafer and mask tuning system

News

ZEISS has introduced the new ZEISS ForTune system for photomask tuning. With its latest optical design, it takes two main mask tuning processes to the next level in terms of efficiency, accuracy and throughput. The first tool has already been delivered to the first customer.

The new ZEISS ForTune mask tuning system combines the capabilities from ZEISS CDC and RegC® in a new advanced system. This means mask registration and Critical Dimension Uniformity (CDU) can be completed in one process. It helps to:

1. Expand the Lithography Process Window and reduce the wafer intrafield hot spots (using the CDC technology)

2. Improve wafer intra-field On-Product Overlay and enhance Mask Image Placement (using the RegC® technology)

ZEISS ForTune is a state-of-the-art technology with advanced system and optics design, allowing for high process efficiency and prediction accuracy, as well as for significantly improved output.

The mask tuning system has been first introduced to Wafer Fab customers at the SEMICON West in San Francisco, USA in July 2016 and was much appreciated. "In order to produce IC devices at sub-16nm design nodes, semiconductor manufacturers are integrating many novel technologies, including multiple patterning, spacer pitch splitting, 3D logic and memory structures, new materials and complex reticles. Using these new technologies requires tight specifications for On-Product Overlay, Mask Registration, and Lithography Process Window. ForTune is a powerful new technology that enables Mask Makers and Wafer Fabs to tackle these challenges in a fast and cost-effective way", states Ofir Sharoni, Product Manager of ZEISS ForTune in Karmiel, Israel. Another presentation of the new system will take place at the SPIE Photomask Conference in September 2016 in San Jose, USA.

Besides the official product launch, the next generation Wafer and Mask Tuning System has already been successfully delivered to an US based chip manufacturer, who ordered the new ZEISS ForTune system earlier this year. 

Purdue, imec, Indiana announce partnership
Resilinc partners with SEMI on supply chain resilience
NIO and NXP collaborate on 4D imaging radar deployment
Panasonic Industry digitally transforms with Blue Yonder
Global semiconductor sales decrease 8.7%
MIT engineers “grow” atomically thin transistors on top of computer chips
Keysight joins TSMC Open Innovation Platform 3DFabric Alliance
Leti Innovation Days to explore microelectronics’ transformational role
Quantum expansion
indie launches 'breakthrough' 120 GHz radar transceiver
Wafer fab equipment - facing uncertain times?
Renesas expands focus on India
Neuralink selects Takano Wafer Particle Measurement System
Micron reveals committee members
Avoiding unscheduled downtime in with Preventive Vacuum Service
NFC chip market size to surpass US$ 7.6 billion
Fujifilm breaks ground on new €30 million European expansion
Fraunhofer IIS/EAS selects Achronix embedded FPGAs
Siemens announces certifications for TSMC’s latest processes
EU Chips Act triggers further €7.4bn investment
ASE recognised for excellence by Texas Instruments
Atomera signs license agreement with STMicroelectronics
Gartner forecasts worldwide semiconductor revenue to decline 11% in 2023
CHIPS for America outlines vision for the National Semiconductor Technology Center
TSMC showcases new technology developments
Alphawave Semi showcases 3nm connectivity solutions
Greene Tweed to open new facility in Korea
Infineon enables next-generation automotive E/E architectures
Global AFM market to reach $861.5 million
Cepton expands proprietary chipset
Semtech adds two industry veterans to board of directors
Specialty gas expansion
×
Search the news archive

To close this popup you can press escape or click the close icon.
Logo
×
Logo
×
Register - Step 1

You may choose to subscribe to the Silicon Semiconductor Magazine, the Silicon Semiconductor Newsletter, or both. You may also request additional information if required, before submitting your application.


Please subscribe me to:

 

You chose the industry type of "Other"

Please enter the industry that you work in:
Please enter the industry that you work in: