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MINATEC-LETI To Host Atomic Scale Processing Workshop

Free event will focus on recent progress plus future trends in research and development

On Tuesday 4th April 2017, MINATEC-LETI  will host a technical workshop on atomic scale processing in Grenoble. The free event will include a wide range of talks presented by Oxford Instruments process and technology experts, MINATEC-LETI, Eindhoven University of Technology (TU/e) and other guest speakers.

Ground breaking research into a number of exciting areas in atomic scale processing is taking place at MINATEC-LETI using Oxford Instruments' plasma etch and deposition systems.

The workshop is open to anyone working in industry and academia with an interest in recent progress plus future trends in research and development, the application of atomic layer etching and deposition, and high precision ion-beam processing.

Talks will include:

·  Introduction to the CEA-LETI and its research, Bernard André, lab manager, DOPT, LETI CEA-LETI

· Atomic Layer Etch (ALE): A precision technique to enable tomorrow's technology, Dr Mike Cooke, Oxford Instruments

·  Etching talk (title to be confirmed),  Dr Thierry Chevolleau, CEA/PTA

· 2D materials and ALD applications, Dr Ageeth Bol, TU/e Eindhoven, NL

· Ion Beam developments in etch and deposition, Dr Sebastien Pochon, Oxford Instruments 

· Ion Beam research at LETI, Dr Sylvain Gout, LETI

· Atomic Layer Deposition (ALD): New developments for Atomic Scale Processing, Dr Harm Knoops, Oxford Instruments

· 2D materials fabrication technology and processes "“ The "˜Toolbox' for Atomic Scale Processing, Dr Ravi Sundaram, Oxford Instruments

· Technical posters

"This event offers attendees the opportunity to learn about current and future research topics in Atomic Layer Etch, Atomic Layer Deposition, Ion Beam technologies and other key processes working at the atomic scale, and to meet the experts in their field in a relaxed environment.", comments Frazer Anderson, strategic business development director at Oxford Instruments Plasma Technology, "This workshop will let participants connect with their peers, offering a great learning opportunity for us all."

Places can be booked at

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AngelTech Live III will be broadcast on 12 April 2021, 10am BST, rebroadcast on 14 April (10am CTT) and 16 April (10am PST) and will feature online versions of the market-leading physical events: CS International and PIC International PLUS a brand new Silicon Semiconductor International Track!

Thanks to the great diversity of the semiconductor industry, we are always chasing new markets and developing a range of exciting technologies.

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Additional areas we will cover include the development of GaN ICs, to improve the reach of power electronics; the great strides that have been made with gallium oxide; and a look at new materials, such as cubic GaN and AlScN.

Having attracted 1500 delegates over the last 2 online summits, the 3rd event promises to be even bigger and better – with 3 interactive sessions over 1 day and will once again prove to be a key event across the semiconductor and photonic integrated circuits calendar.

So make sure you sign up today and discover the latest cutting edge developments across the compound semiconductor and integrated photonics value chain.


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