Veeco CNT ships 500th Atomic Layer Deposition system
North Carolina State University to use Fiji G2 ALD system in research on wide bandgap power devices, memory and sensors
Veeco CNT, formerly known as Ultratech/Cambridge Nanotech, has shipped its 500th Atomic Layer Deposition (ALD) system. The customer is North Carolina State University.
"The Veeco CNT Fiji G2 ALD system will be a critical tool to meet our ambitious research goals," said Bongmook Lee, research assistant professor of the NSF NERC ASSIST Center at North Carolina State University.
He added: "This ALD tool enables advances in our research for high performance CMOS, non-volatile memory, next-generation wide bandgap power devices, and environmental and physiological sensors.
"We selected the Veeco CNT Fiji G2 for its demonstrated ability to reliably deposit the most challenging oxide and nitride thin films. We are happy to be part of this milestone in receiving the 500th system and we continue to engage in a strong relationship with Veeco CNT."
The Veeco CNT Fiji G2 ALD System is a thin film next-generation ALD system capable of performing thermal and plasma-enhanced deposition in a modular, high-vacuum, flexible architecture that accommodates a wide range of deposition modes using multiple configurations of precursors and plasma gases.
The system's intuitive interface is designed to makes it easy to monitor and change recipes and processes.
"Our 500th ALD system shipment validates the increasing interest in ALD technology," said Ganesh Sundaram, vice president of Applied Technology, Veeco CNT. "Now, with the backing of Veeco, we will continue our legacy to build and enhance the deployment of ALD technology, helping customers like North Carolina State University develop next generation electronic devices."
Veeco CNT is a platinum sponsor of the 17th International Conference on Atomic Layer Deposition (ALD 2017) that takes place on July 15-18, 2017 in Denver, Colorado. Ultratech-CNT will be exhibiting as well as presenting a number of papers.
