Samsung Successfully Completes 5nm EUV Development
Samsung Electronics has announced that its 5-nanometer (nm)
FinFET process technology is complete in its development and is now ready for
customers' samples. By adding another cutting-edge node to its extreme
ultraviolet (EUV)-based process offerings, Samsung is proving once again its
leadership in the advanced foundry market.
Compared to 7nm, Samsung's 5nm FinFET process technology
provides up to a 25 percent increase in logic area efficiency with 20 percent
lower power consumption or 10 percent higher performance as a result of process
improvement to enable us to have more innovative standard cell architecture.
In addition to power performance area (PPA) improvements
from 7nm to 5nm, customers can fully leverage Samsung's highly sophisticated
EUV technology. Like its predecessor, 5nm uses EUV lithography in metal layer
patterning and reduces mask layers while providing better fidelity.
Another key benefit of 5nm is that we can reuse all the 7nm
intellectual property (IP) to 5nm. Thereby 7nm customers' transitioning to 5nm
will greatly benefit from reduced migration costs, pre-verified design
ecosystem, and consequently shorten their 5nm product development.
As a result of the close collaboration between Samsung
Foundry and its 'Samsung Advanced Foundry Ecosystem (SAFE™)' partners, a robust
design infrastructure for Samsung's 5nm, including the process design kit
(PDK), design methodologies (DM), electronic design automation (EDA) tools, and
IP, has been provided since the fourth quarter of 2018. Besides, Samsung
Foundry has already started offering 5nm Multi Project Wafer (MPW) service to
“In successful completion of our 5nm development, we've
proven our capabilities in EUV-based nodes,” said Charlie Bae, Executive Vice
President of Foundry Business at Samsung Electronics. “In response to
customers' surging demand for advanced process technologies to differentiate
their next-generation products, we continue our commitment to accelerating the
volume production of EUV-based technologies.”
In October 2018, Samsung announced the readiness and its
initial production of 7nm process, its first process node with EUV lithography
technology. The company has provided commercial samples of the industry's first
EUV-based new products and has started mass production of 7nm process early
Also, Samsung is collaborating with customers on 6nm, a
customized EUV-based process node, and has already received the product
tape-out of its first 6nm chip.
Mr. Bae continued, "Considering the various benefits
including PPA and IP, Samsung's EUV-based advanced nodes are expected to be in
high demand for new and innovative applications such as 5G, artificial
intelligence (AI), high performance computing (HPC), and automotive. Leveraging
our robust technology competitiveness including our leadership in EUV
lithography, Samsung will continue to deliver the most advanced technologies
and solutions to customers.”
Samsung foundry's EUV-based process technologies are
currently being manufactured at the S3-line in Hwaseong, Korea. Additionally,
Samsung will expand its EUV capacity to a new EUV line in Hwaseong, which is
expected to be completed within the second half of 2019 and start production
ramp-up from next year.