Tokyo Electron Announces PICP Pro Plasma Etch Systems
*PICP: A plasma module that generates highly uniform, high-density plasma on a panel substrate.
Tokyo Electron (TEL) has announced the launch of Impressio 1800 PICP* Pro and Betelex 1800 PICP Pro, the company’s latest plasma etch systems featuring the new PICP Pro chamber for high resolution processing of 6th generation (G6: 1,500 mm x 1,850 mm) glass substrates.
In the G6 display segment where smartphones are the main application, the wider adoption of high resolution OLED is expanding, and further innovations enabling lower power consumption and smarter user interfaces are eagerly awaited. Such innovative technologies would require densely packed circuit patterns, which calls for more rigorous control capabilities in manufacturing equipment than ever before.
In response to these market demands, TEL has developed PICP Pro, which offers a new capability to control the plasma-space-generating area while retaining the high-precision etch performance of TEL’s proprietary PICP high-density plasma source. The newly added capability reduces the generation of particles that adversely affect maintenance and yield, achieving lower running costs than those for previous PICP.
“PICP Pro is TEL's original development considering our customers’ true needs in their mass-production lines,” said Hiroshi Ishida, FPD Business Unit General Manager at TEL. “PICP Pro offers superior etch precision and higher yield in the advanced display segment.”
