MII ships Jet and Flash imprint lithography systems
Molecular Imprints, Inc. (MII), an innovator in advanced semiconductor lithography and nanopatterning systems, has shipped the first of three advanced imprint modules.
Scheduled for this quarter, the systems will be integrated into MII's equipment partner's stepper systems.
These modules include the latest MII proprietary Jet and Flash Imprint Lithography (J-FIL) technology which will deliver the performance required for high volume manufacturing of advanced semiconductor memory devices at sub-20nm dimensions.
"Our latest imprint module shipments incorporate enhanced magnification control and exposure technology along with better onboard resist filtration, real time precision machine controls, and an upgraded resist jetting system which significantly improve defectivity, throughput, overlay accuracy and overall cost of ownership," says Mark Melliar Smith, Chief Executive Officer of Molecular Imprints.
"All these improvements were achieved while still delivering a lower cost system platform and smaller footprint. I want to congratulate our development and engineering teams for another outstanding job in product design and development and recognise the support and collaboration we received from our equipment partner. We look forward to seeing these systems in action at our semiconductor customer's production facility later this year," adds Smith.