Picosun reveals 450mm ALD system
Picosun Oy, has introduced the PICOSUN P-1000 ultra-large scale batch ALD tool.
This is the latest addition to the fully automated, high throughput PICOSUN P-series of Atomic Layer Deposition (ALD) tools. The P-1000 system shares the same core construction as the smaller PICOSUN systems.
Picosun says that already the first process results with the P-1000 ALD system have been excellent.
When using an aluminium oxide process on 400mm x 600mm glass sheets in a batch of 30 pieces, a film thickness non-uniformity of only 1.55 percent (1σ) was achieved, while maintaining a temperature distribution non-uniformity of only ± 2oC inside the reaction chamber.
The PICOSUN P-1000 batch ALD reactor's deposition chamber can be made according to the customer's specified substrate size. As square, the maximum cross section of the chamber is 470mm x 470mm, and as circular, the maximum diameter is 600mm. The maximum height of the chamber is 700mm.
The square chamber is optimal for coating batches of 450mm diameter silicon wafers - the next step in the evolution of the modern semiconductor manufacturing technology - or batches of large glass or metal sheets.
Also smaller silicon wafers or 156mm x 156mm square solar wafers can be processed with their own, specifically designed sample holders. Alternatively, when equipped with the cylindrical reaction chamber the configuration is ideal for processing large batches of 3D objects.
The P-1000 system comes with a separate electronics and precursor source cabinet designed for fast and easy maintenance, while keeping the tool frame and footprint plain and compact to save expensive facility space.
Eight separate precursor manifolds and software capable of controlling 12 individual precursor sources ensure the highest level of flexibility in process development and ALD material selection.
Timo Malinen, Chief Operating Officer of Picosun, summarises by saying, "Launching the P-1000 ultra-large batch ALD tool marks an important milestone in establishing Picosun as the leading industrial supplier of large-scale ALD solutions."
"While the ALD technology makes breakthroughs in more and more new industries, the demands for processing equipment capacity and flexibility regarding sample size, shape, and process throughput expand accordingly," he adds.
"With the P-1000 system, Picosun can rapidly answer these new challenges and enhance our position as the world's most experienced ALD technology provider. This experience again manifests itself in the state-of-the-art technical design and excellent process results of the P-1000 tool."
