Annealsys and INL unite to advance CVD & ALD processes
A new partnership between Annealsys and Institut des Nanotechnologies de Lyon (INL), called 'InCVD,' will leverage the expertise of both entities and will be driven by common research and innovation objectives.
The common laboratory will focus on developing new materials, particularly addressing the monolithic integration of functional oxides on semiconducting and on graphene platforms, using the DLI-MOCVD/ALD equipments developed by Annealsys.
The lab will be supported by the French National Research Agency.
InCVD is dedicated to innovating chemical vapour deposition processes and associated materials and will be directed by Catherine Dubourdieu (INL) in association with Jean-Manuel Decams (Annealsys).
The scientific, technical and innovation program has three main objectives. The first and second are to improve the CVD/ALD processes and develop innovative materials in thin films and heterostructures. The third aim is to integrate the devices for nanoelectronic and energy applications.
The InCVD lab will be a development platform for the demonstration of added-value materials and Annealsys reactors performance. The common innovation, technical and scientific program addresses:
Monolithic integration of functional oxides on silicon and graphene for nanoelectronic devices (logic and memories). From a process standpoint the challenge of composition control for ternary oxides grown by CVD and ALD will be addressed
Defects engineering (oxygen vacancies) in binary oxide nanolaminates based on HfO2 and other binary oxides that can be programmed to multiple stable resistive states (memristors) for neuromorphic computing. The ability to isolate the reactor chamber from the evaporator will be an advantage to finely control interfaces for multilayer growth
1D nanostructure growth of piezoelectric and ferroelectric oxides by filling porous polymeric membranes. Both ALD and Pulsed Pressure CVD will be investigated for this purpose
The InCVD common laboratory is a unique opportunity for Annealsys to enhance expertise in CVD/ALD processes and to provide applications data to company customers.
Annealsys designs, builds and manufactures systems for Research and Development and small scale production. Founded in 2004, Annealsys is a supplier of Rapid Thermal Processing (RTP) systems and a pioneer for Direct Liquid Injection MOCVD/ALD machines.
