News Article
EVG unleashes nanoimprint lithography tool for bioMEMS
The EVG720 UV-NIL system provides excellent throughput and low cost of ownership with integrated soft template replication capability
Providing full-field imprint lithography with an integrated soft stamp/template fabrication capability, the EVG720 system enables throughputs of more than 60 wafers per hour with the lowest cost of ownership (CoO).
EVG720 UV nanoimprint lithography system
Capable of printing nanostructures as small as 40 nm in diameter over a large area in volume production, the EVG720 system is ideally suited for use in bioMEMS, advanced data storage and other semiconductor devices. Several systems have already been installed, evaluated and accepted at customer sites.
The EVG720 UV-NIL system - EVG's most advanced dedicated NIL system - utilises a next-generation UV-NIL process designed specifically to address the needs of high-volume manufacturing. It combines high throughput, ease of use and high resolution - enabling volume manufacturing of nanoscale structures at the lowest CoO.
EVG's UV-NIL solutions, including the EVG720 system, are designed to work with a wide variety of resist materials. This open materials platform approach provides customers with a high degree of flexibility and process customisation.
In addition, the EVG720 has an integrated stamp replication capability, which minimises tool footprint and avoids increased capital equipment costs associated with stand-alone replication systems. EVG's soft working stamps have optimised releasing properties that extend the life of the stamp and enable ideal imprint results on both flat and rough substrates.
Traditional stamps wear down quickly or require additional surface treatment after each imprint and result in increased defectivity on the substrate that leads to yield loss, as well as increased costs from continuous replacement.
"EV Group continues to extend its leadership in low-cost, high-throughput and reliable NIL solutions with our new EVG720 platform, which is built on nearly 20 years of experience with more than 100 UV-based imprint lithography systems in the field," states Gerald Kreindl, business development manager at EV Group.
"We recognise that a one-size-fits-all approach to NIL can't address every customer's unique manufacturing requirements, which is why EV Group has created a complete NIL solutions portfolio that encompasses all widely accepted imprint techniques - UV-NIL, hot embossing, micro contact printing, step-and-repeat, full-field, and roll-to-roll imprint. In addition, we are continuously working to improve the imprint lithography infrastructure by collaborating with companies and research organisations throughout the imprint lithography supply chain," he continues.
EVG will describe its latest developments in nanoimprint lithography and other processing solutions at the company's booth #4B-207 in the Makuhari Messe International Convention Complex in Chiba, Japan at SEMICON Japan. The show will take place from December 4th to 6th.
During the show's technical program, EVG will present "EVG's HVM solution updates for automotive and smart phone applications," during the Exhibitor Seminar on Wednesday, December 4th from 2:30 to 3:20 p.m. at the International Conference Halls, Room 103.
Also, Masaya Kawano, head of technology Japan / applications engineer for the Technology Division of EV Group Japan, will present "Latest wafer bonders which drive 3D-IC technology" at the Proposals to the Assembly Technologies to Drive 3D-IC session on Friday, December 6th from 1:45 to 2:00 p.m. at the TechSTAGE West, Hall 1.
