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Advanced Energy highlights pulsing technology for 2X/1X nm


The firm's power conversion solution with multi-level pulsing enables exceptional Pplasma management for PECVD, PEALD, and advanced etch applications

Advanced Energy Industries highlighted its advanced pulsing technology at SEMICON Korea 2014. The company will showcase its single- and multi-level RF pulsing platform, essential for sub 22 nm node migration.

The RF product line-up includes 400 kHz to 60 MHz power delivery systems with breakthrough features to improve etch rate selectivity, feature profile control and film thickness uniformity.

Advanced digital matching networks complete the power delivery system and provide fast and accurate tune-while-pulsing capability to keep pace with the rapid process steps in pulsed plasma applications.

Yuval Wasserman, president of AE Thin Films, says, "Our comprehensive RF product suite enables the differentiated pulsing technology necessary for manufacturing 3DIC/FinFETs, V-NAND and MEMs. Korea has become an innovation centre of excellence for these applications, and our distributed R&D model supports our customers' activities with local development capability. AE offers not only unrivalled plasma management but an efficient business model with a design centre in Seoul focused on lean engineering and operational excellence - allowing our design team to develop world-class RF power and match products at an accelerated time-to-market."

In addition to the RF pulsing platform, Advanced Energy will display its other dynamic products for semiconductor and thin-film processing applications, including:

    Optical fibre thermometers (OFTs), delivering precise multi-channel wafer temperature monitoring and control

    Remote plasma sources for wafer processing, and point-of-use PFC abatement sources for low COO sustainability

    DC and pulsed DC power supplies for reliable, cost-effective, custom film deposition for ceramic, metal and reactive PVD

At SEMICON Korea, co-located with LED Korea, Advanced Energy will also debut its MXE high-speed pyrometer - enabling accurate, repeatable measurement and control for demanding MOCVD applications. With up to a 10 kHz read rate, the MXE pyrometer is ideal for processes with high susceptor rotation speeds such as HB-LED growth. Precision temperature measurement, combined with 950 nm wavelength reflectance measurements, significantly enhances product yield.

SEMICON Korea takes place at the COEX Exhibition Centre in Seoul, February 12th to 14th. Advanced Energy will be showcasing its products in Hall A, booth #2612.

Headquartered in Fort Collins, Colorado, Advanced Energy is a supplier of power conversion solutions used in thin-film plasma manufacturing processes and solar energy generation.

 

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