News Article
New Plasma Etch tools require no CF4 for PCBs
Plasma Etch is launching what it says is the first plasma etching systems used in the manufacturing production of PCBs that requires no CF4.
The patent pending system uses 3-phase power and compressed air.
The new technology inside the Magna completely eliminates the need for CF4 gas which is presently used by PCB manufacturers plasma etching systems for de-smear and etch back processing.
Magna is the next generation replacement its MK-II line of systems for de-smear and etch back applications.
The technology is said to provide faster etch times, lower operating cost, lower power usage, and incredible process uniformity not achievable using existing MK-II type technologies.
Plasma Etch claims the Magna provides precision and uniform etching on both sides of panels simultaneously.
The patent pending system uses 3-phase power and compressed air.
The new technology inside the Magna completely eliminates the need for CF4 gas which is presently used by PCB manufacturers plasma etching systems for de-smear and etch back processing.
Magna is the next generation replacement its MK-II line of systems for de-smear and etch back applications.
The technology is said to provide faster etch times, lower operating cost, lower power usage, and incredible process uniformity not achievable using existing MK-II type technologies.
Plasma Etch claims the Magna provides precision and uniform etching on both sides of panels simultaneously.
