Zeiss and NuFlare continue lithography collaboration
The development of mask writing and mask registration tools is a real enabler for the industry. Advances on both sides promote next generation lithography technologies such as Multi-Patterning, Directed Self-Assembly and EUV as well as EUV and 193i mix-and-match using cut masks
NuFlare Technology has approved factory specifications of its next generation mask metrology tool PROVE HR, pictured above.
Zeiss' PROVE is said to enable the calibration of most advanced mask writing tools needed to support upcoming optical as well as next generation lithography technologies like EUV.
The system was shipped to Japan at the end of March.
The new PROVE HR is claimed to have a superior resolution realised by a redesigned beam path working with an NA of 0.8 at 193nm wavelength.
Fumiaki Shigemitsu, President of NuFlare Technology, Inc., says, "The achieved measurement results are beyond our expectations and allow us, to adjust even the smallest deflection fields in our e-beam tools for any remaining placement error. The much higher sampling of small features enables a better tool calibration of our e-beam writers."
Nuflare will use the Zeiss metrology tool to develop special calibration routines for the newest mask writer generations.
Oliver Kienzle, Managing Director of Carl Zeiss SMS GmbH highlights the benefits of the successful cooperation. He says, "The coherent development of mask writing and mask registration tools is a real enabler for the industry. The advances on both sides promote next generation lithography technologies such as Multi-Patterning, Directed Self-Assembly and EUV as well as EUV and 193i mix-and-match using cut masks. Therefore we are looking forward to extend our cooperation with NuFlare Technology in the future."
