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SUSS MicroTec and NuFlare agree on collaboration

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NuFlare Technology, electron-beam mask writers and SUSS MicroTec, a global supplier of equipment and process solutions for the semiconductor industry and related markets, has announced a cooperation to combine their expertise in Photomask Equipment and process solutions.

NuFlare Technology will install a SUSS MicroTec MaskTrackPro bake and develop system into their main manufacturing fab, in Yokohama, Japan, in early 2015. The MaskTrackPro system is designed and manufactured to meet the most demanding requirements for masks used in NGL (Next Generation Lithography), such as EUVL (Extreme-Ultraviolet Lithography), 193i extension and NIL (Nano-Imprint Lithography).

Since its release by SUSS MicroTec in 2010, more than 30 systems have been shipped to customers worldwide. NuFlare Technology and SUSS MicroTec will jointly work on advanced process solutions, closely integrating the latest NuFlare EB-writer, EBM-9000 and MaskTrackPro.

'In the semiconductor industry, equipment suppliers are responsible for a smooth and fast start-up of their systems into production.', says Yuta Nagai, General Manager of SUSS MicroTec Photomask Equipment. 'Our valuable partnership with NuFlare allows both companies to provide solid turn-key equipment and technology solutions to mask makers worldwide.'

'Integration between mask writer and develop system is indispensable to accommodate a tighter accuracy request from our high-end customers. I believe the collaboration between SUSS MicroTec and NuFlare will allow us to give them the solution.', says Fumiaki Shigemitsu, President of NuFlare Technology, Inc.

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