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Entrepix Adds 300 mm CMP Capabilities to Phoenix Foundry

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Entrepix, Inc., a provider of chemical mechanical polishing (CMP) equipment and process services, has announced that it has expanded its foundry operations in Phoenix, Arizona by installing 300 mm chemical mechanical planarization (CMP) processing. The new offering expands on the company's existing 200mm and below foundry operations, allowing Entrepix to offer CMP R&D and volume production for all wafer sizes up to 300 mm.

 To achieve this capability, Entrepix added industry leading AMAT Reflexion and Ebara F-REX 300 CMP polishing platforms in its Class 100 cleanroom. Both systems are available for various applications, including various dielectrics, metals and substrates. Additionally, the systems can be used for screening or comparing consumable sets (pads, slurries, pad conditioners and cleaning chemistries) across both platforms.

"Our foundry operations offer our customers a capability that is unique in the industry," said Tim Tobin, CEO of Entrepix. "Our CMP consumable customers can benefit from creating independent, non-biased performance data for their products." 

The Entrepix foundry provides complete CMP solutions for customers at any level of development or production, allowing customers to quickly react to new technology requirements while capitalizing on increased capacity demands. This flexible manufacturing model improves financial performance by optimizing internal efficiencies and reducing time to revenue.


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