Brewer Science Presents lithography Research at CSTIC
Brewer Science invites you to attend China Semiconductor Technology International Conference 2016 (CSTIC 2016), where Senior Scientist Zhimin Zhu will share new findings on chemical effects in lithography on Sunday, March 13. CSTIC 2016 is regarded as the largest and most comprehensive semiconductor technology conference in China. All aspects of semiconductor technology and manufacturing, including devices, design, lithography, integration, materials, processes, and manufacturing, as well as emerging semiconductor technologies and silicon material applications, will be covered by industry experts at CSTIC 2016. Dr. Zhu has been selected to present Brewer Science's new findings on the effect of molecular forces in lithography.
Join Brewer Science at the following session:
Dr. Zhimin Zhu, Senior Scientist, will present "Investigation of Chemical Effects in Lithography" at Symposium II: Lithography & Patterning, Session II "“ Computational Lithography, third floor, Yellow River Hall, Sunday, March 13, at 4:45 pm.
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