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Lab News

News

Monday 17th June 2024

EV Group and Fraunhofer IZM-ASSID expand partnership

News

Thursday 6th June 2024

CEA-Leti reports three-layer integration breakthrough

News

Wednesday 5th June 2024

Imec demonstrates die-to-wafer hybrid bonding with a Cu interconnect pad pitch of 2µm

News

Tuesday 4th June 2024

ASML and imec open joint High NA EUV Lithography Lab

News

Friday 24th May 2024

£3m grant for Glasgow chip research

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Thursday 23rd May 2024

EU funding for Tampere University's semiconductor pilot line

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Wednesday 22nd May 2024

Imec and Sarcura introduce scalable on-chip detection of human white blood cells

News

Thursday 9th May 2024

Quantum breakthrough?

News

Tuesday 30th April 2024

CEA-Leti to report on latest packaging research

News

Monday 29th April 2024

CEA-Leti to coordinate 6G EU projects

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Thursday 18th April 2024

Quantum processor testing and measurement facilities up and running

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Wednesday 10th April 2024

Manufacturing innovation centre focuses on electrification

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Wednesday 3rd April 2024

Imec demonstrates compact 32-channel silicon-based wavelength filter

News

Friday 29th March 2024

VTT works to develop wearable sensors

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Thursday 28th March 2024

Advanced packaging advances next wave of innovation in global chips manufacturing

News

Wednesday 27th March 2024

Complete vascularisation of organoids on microfluidic chip

News

Tuesday 26th March 2024

Researchers design new analog chip architecture with high precision

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Thursday 21st March 2024

New Si2 Open Model Interface

News

Wednesday 20th March 2024

Spanish government, region of Andalusia and imec sign MoU

News

Monday 18th March 2024

£35m boost for British semiconductor scientists and businesses

News

Monday 11th March 2024

AMD’s Lisa Su honoured with the 2024 imec Innovation Award

News

Tuesday 5th March 2024

Samsung and Nova publish joint research

News

Friday 1st March 2024

Imec presents levers to reduce the CO2 equivalent footprint of lithography and etch

News

Thursday 29th February 2024

Imec demonstrates readiness of the High-NA EUV patterning ecosystem

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