Resistivity research uncovers thin film star material

Zsolt Tőkei, fellow and program director of nano-interconnects at imec, explains the work behind the first experimental evidence that the resistivity of a thin conductor film on a 300mm silicon wafer can be lower than that of copper or ruthenium. Zsolt explains the research methodology of the project, commenced in 2016, and shares his excitement as to how the research will identify and categorise various binary and ternary alloys that can outperform copper and ruthenium when it comes to interconnect lines.