VIDEO
Imec demonstrates logic and DRAM structures using High NA EUV Lithography
Video Summary
Kurt Ronse, Advanced Patterning Program Director at imec, discusses the background to this exciting technical breakthrough, the results of which confirm the readiness of the High NA EUV patterning ecosystem for future logic and memory use cases. Kurt talks through the details of the successful demonstrations, explaining the significance of this work, as well as looking ahead to the future of both High NA and the possibilities for Hyper-NA EUV lithography over time.
This video is part of a collection: SiS Issue 7 - Part 2
