VIDEO
Transforming EBL into a volume-production system for emerging applications
Video Summary
Kenneth MacWilliams, Multibeam President, explains the company’s new MB platform – a multicolumn E-Beam Lithography (EBL) tool for volume production of compound ICs, advanced packaging and other applications. The tool architecture features multiple columns that operate individually and in parallel, with an advanced control system directing the beams to achieve maximum accuracy, quality, and speed. This drives the throughput advantage – up to 100x higher than conventional EBL tools.
This video is part of a collection: SiS - 2024 Issue 7 - Part 1
