VIDEO
Nitrogen bubbling technology solved poor wet etching uniformity and by-product regrowth
Video Summary
Jim Straus, Vice President of Sales and Leo Archer, Program Director, Technical, both at ACM Research, discuss the recently announced major upgrades to the company’s Ultra C wb cleaning tool, including a patent-pending nitrogen bubbling technology to provide significant wet etching uniformity improvement and enhanced cleaning performance. The technology holds significant application potential in the wet etching process for manufacturing 3D DRAM, 3D logic and 500 layer 3D NAND devices.
This video is part of a collection: SiS Magazine - 2025 Issue 9 - Part 2
