VIDEO
The perc(s) of polymer residue removal
Video Summary
Fabio Wörndl, Co-CEO and CMO, Siconnex, explains how the company’s perc™ solution cuts costs by eliminating solvents while achieving 100% polymer removal and also eliminates the need for solvents. perc™ offers flexible solutions for removing residues after dry etching, including metal, oxide, silicon, or VIA etching. Fabio goes on to discuss the semiconductor industry’s journey towards NetZero as well as some of the challenges and opportunities which lie ahead in 2025.
