VIDEO
ASML and imec open joint High NA EUV Lithography Lab
Video Summary
Kurt Ronse, Director of the Advanced Patterning Program Director at imec, explains how the opening of the joint ASML-imec High NA EUV Lithography Lab marks a milestone in preparing High NA EUV lithography for accelerated adoption in mass manufacturing - offering an early development platform to the leading-edge semiconductor ecosystem.
This video is part of a collection: SiS - 2024 Issue 7 - Part 5
