VIDEO
Imec unlocks lever for EUV dose reduction
Video Summary
Ivan Pollentier, Senior Researcher at imec, explains how the research organisation has demonstrated that precise control of gas compositions during post-exposure EUV lithography steps can help in minimising the required exposure dose, thereby unlocking higher wafer throughput. In particular, improved dose response of metal-oxide photoresists (MORs) has been achieved when the EUV post-exposure bake step is performed under elevated oxygen concentrations.
